There are many methods for manufacturing microarray lenses in the industrial research room, the main ones are the photosensitive glass thermoforming method, laser direct writing method, photoresist thermal reflow method, reactive ion etching method, hot compression molding method, etc. Methods, this article mainly introduces the main and most widely used methods for everyone.
The photoresist thermal reflow technology method is mainly divided into three steps: 1. Use the target pattern as the exposure group (regular hexagon, rectangle, or circle) and use the mask to expose the photoresist of the substrate. 2. Clean the remaining debris. 3. Heat it on the heating platform to make it heat-melt and form.
Advantages: simple process, low requirements for materials and equipment, easy to expand production and control process parameters
Disadvantages: The finished product will be produced due to its own problems in the process, and the produced microlens is not very ideal. Secondly, due to the mechanical properties and chemical properties of the material, the optical properties are not very good.
Laser direct writing technology The laser direct writing method mainly has the following steps: 1. Design the exposure structure of the microlens array on the computer 2. Design the pattern to be written in the laser direct writing system 3. Place the substrate with photoresist on the direct writing platform Laser writing is carried out, and the surface residues are cleaned after writing. Get the array structure.
Its advantages are: high precision, suitable for model making, easy to expand production, high quality, and low cost
Fabrication of Quartz Microlens Array The general process of preparing photoresist microlens pattern array is as follows: select the substrate material, prepare the substrate material, homogenize the gel on the quartz substrate, you can choose to use multiple spinning centrifugation to homogenize the gel, and use ultraviolet A photoresist mask is prepared on the photoresist by light, and then exposed with a chromium plate, and the pattern of the mask can be obtained after development and washing. Heat treatment of the obtained reticle pattern. When the quartz plate whose surface is covered by the resist pattern is heated to a certain temperature in the melting area of the photoresist, the surface tension is different, resulting in the interfacial tension between the resists. At the same time, the temperature is controlled to form a rectangular arched surface photo-etched microlens pattern.
Quartz microlens arrays are etched using argon ion beams. The sputtering etching technique that uses ion beams with energy to bombard the surface of the target material is called ion etching. It can be understood that the etching speed of the ion beam is closely related to various factors such as the choice of material, the amount of energy carried by the ion beam, and the choice of angle during etching. The study found that the etching speed of quartz is a little higher than that of the mask pattern made of photoresist, and the maximum speed is also higher than the pattern of the selected photoresist mask. The angle at which the peak appears will also increase as the energy of the bombarding ion beam increases. Therefore, optimizing the conditions of the ion etching beam can realize the effective transfer of the photo-etched pattern to the quartz substrate.